Chemical Vapor Deposition is a fast growing field where new uses are being discovered daily. This process is a way for new materials to be added to existing materials in hopes of making them better. It is used in the semi-conductor industry to make capacitors with the thinnest possible barrier between electrodes. It is being used in the medical field to coat implants for patients in hopes of making safer more useful products. It is also being used in the machine industry where drill bits are being coated with synthetically grown diamonds with create a much harder longer lasting bit that can bore threw harder materials at greater speed for longer. In this paper I will discuss what chemical vapor deposition is and how it is used. Along with that I will talk about what goes into this process and what the parameters are in choosing this process. .
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Before getting into what Chemical Vapor Deposition is we much first learn what deposition is. Deposition is a physical change in an element. When I say physical change I mean like evaporation when a material goes from liquid to gas state. Or freezing is when a material goes from liquid to solid state. Deposition is like sublimanation where instead of going from a solid to gas while skipping the whole liquid state a material goes from gas to solid skipping the whole liquid state. Now that we know what deposition is now we can start describing what Chemical Vapor Deposition means.
Generally there are two types of Deposition. There is Physical Vapor Deposition and there is Chemical Vapor Deposition. In Physical Vapor Deposition they use a couple different techniques like; vacuum evaporation, sputtering and molecular beam epitaxy (MBE). In Chemical Vapor Deposition there are a couple different techniques as well, including; atmospheric pressure chemical vapor deposition (APCVD), low-pressure chemical vapor deposition (LPCVD), plasma assisted (enhanced) chemical vapor deposition (PACVD, PECVD), photochemical vapor deposition (PCVD), laser chemical vapor deposition (LCVD), metal-organic chemical vapor deposition (MOCVD), chemical beam epitaxy (CBE) and chemical vapor infiltration (CVI).
